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XPS study of the chemical surface engineering on ultra-thin InAlN layers:Evaluation of thermal stability to oxygen exposure

Title: XPS study of the chemical surface engineering on ultra-thin InAlN layers:Evaluation of thermal stability to oxygen exposure
Authors: Bourlier, Yoan; Bouttemy, Muriel; Patard, Olivier; Gamara, Piero; Piotrowicz, Stephane; Vigneron, Jackie; Aubry, Raphael; Delage, Sylvain; Etcheberry, Arnaud.
Contributors: Institut Lavoisier de Versailles (ILV); Université de Versailles Saint-Quentin-en-Yvelines (UVSQ)-Institut de Chimie - CNRS Chimie (INC-CNRS)-Centre National de la Recherche Scientifique (CNRS); Microelectronic GaN, III-V Lab, Campus Polytechnique, 1, avenue Augustin Fresnel, 91767 Palaiseau Cédex; Thales Research & Technology, Campus Polytechnique, 1, avenue Augustin Fresnel, 91767 Palaiseau Cédex
Source: ECS meeting ; https://hal.science/hal-04403480 ; ECS meeting, May 2018, Seattle, United States
Publisher Information: CCSD
Publication Year: 2018
Collection: Université de Versailles Saint-Quentin-en-Yvelines: HAL-UVSQ
Subject Terms: [CHIM]Chemical Sciences
Subject Geographic: Seattle; United States
Description: International audience
Document Type: conference object
Language: English
Availability: https://hal.science/hal-04403480
Accession Number: edsbas.13292D3
Database: BASE