| Title: |
Diaphaneity diagrams for analyzing the validity range of analytic optical models |
| Authors: |
Fanny, Lefaucher; Hébert, Mathieu |
| Contributors: |
Laboratoire Hubert Curien (LabHC); Institut d'Optique Graduate School (IOGS)-Université Jean Monnet - Saint-Étienne (UJM); Université Jean Monnet (EPSCPE) (UJM EPE)-Université Jean Monnet (EPSCPE) (UJM EPE)-Centre National de la Recherche Scientifique (CNRS); D. Muselet and R. Pacanowski and H. Rushmeier (Editors) |
| Source: |
MANER 2026 ; https://hal.science/hal-05681570 ; MANER 2026, D. Muselet and R. Pacanowski and H. Rushmeier (Editors), Jun 2026, Bordeaux, France |
| Publisher Information: |
CCSD |
| Publication Year: |
2026 |
| Collection: |
Université Jean Monnet – Saint-Etienne: HAL |
| Subject Terms: |
Model Validation and Analysis; Computational Geometry and Object Modeling-Physically based modeling; [SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic |
| Subject Geographic: |
Bordeaux; France |
| Description: |
International audience ; Recent attempts to determine the optical properties (absorption and scattering coefficients) of translucent materials from affordable instrumentation converged on fixed-geometry spectral measurements and two-flux or four-flux photometric models. They are appealing at an industrial scale due to the measurement simplicity and computational efficiency. However, it is difficult to assess the accuracy of the method because of a lack of ground truth values for the expected coefficients with a given material. In this paper, we address the problem using synthetic data: given optical coefficient values, we predict the measurable reflectance and transmittance of slices of materials using two models -a Monte Carlo (MC) model, which serves as a reference, and the two-flux Kubelka-Munk (KM) model. A large number of coefficient values are tested, allowing to identify the ranges of values for which the KM model predicts measurable quantities consistent with those predicted by MC, and thus to determine its range of validity. To better observe the general trends, we introduce a graphical representation system, called a "diaphaneity diagram," where each sample is represented by a point based on its measurable reflectance and transmittance. By varying the optical coefficients, the two models draw lines whose proximity allows us to visualize their agreement. Then, for some material sample whose reflectance and transmittance have been measured, it is easy to see if its diaphaneity point is located in a region of the diagram where the KM model agrees with the MC model, and thus whether KM can provide relevant optical coefficient values. |
| Document Type: |
conference object |
| Language: |
English |
| Availability: |
https://hal.science/hal-05681570; https://hal.science/hal-05681570v1/document; https://hal.science/hal-05681570v1/file/MAM_Maner2026_diaphaneity_diagrams.pdf |
| Rights: |
https://creativecommons.org/licenses/by-nc/4.0/ ; info:eu-repo/semantics/OpenAccess |
| Accession Number: |
edsbas.19F592B8 |
| Database: |
BASE |