| Title: |
Detecting striations via the lateral photovoltage scanning method without screening effect |
| Authors: |
Kayser, Stefan; Farrell, Patricio; Rotundo, Nella |
| Publication Year: |
2020 |
| Collection: |
Weierstrass Institute for Applied Analysis and Stochastics publication server |
| Subject Terms: |
article; ddc:510; 35Q81; 35K57; 65N08; Numerische Methoden für innovative Halbleiter-Bauteile; Systeme partieller Differentialgleichungen: Modellierung; numerische Analysis und Simulation; Modellierung und Simulation von Halbleiterstrukturen; Photovoltaik; Lateral-photovoltage-scanning method (LPS); semiconductor simulation; van Roosbroeck system; finite volume simulation; crystal growth |
| Description: |
The lateral photovoltage scanning method (LPS) detects doping inhomogeneities in semiconductors such as Si, Ge and Si(x)Ge(1-x) in a cheap, fast and nondestructive manner. LPS relies on the bulk photovoltaic effect and thus can detect any physical quantity affecting the band profiles of the sample. LPS finite volume simulation using commercial software suffer from long simulation times and convergence instabilities. We present here an open-source finite volume simulation for a 2D Si sample using the ddfermi simulator. For low injection conditions we show that the LPS voltage is proportional to the doping gradient as previous theory suggested under certain conditions. For higher injection conditions we directly show how the LPS voltage and the doping gradient differ and link the physical effect of lower local resolution to the screening effect. Previously, the loss of local resolution was assumed to be only connected to the enlargement of the excess charge carrier distribution. |
| Document Type: |
report |
| Language: |
English |
| Relation: |
https://doi.org/10.20347/WIAS.PREPRINT.2785 |
| DOI: |
10.20347/WIAS.PREPRINT.2785 |
| Availability: |
https://doi.org/10.20347/WIAS.PREPRINT.2785; https://archive.wias-berlin.de/receive/wias_mods_00003934; https://archive.wias-berlin.de/servlets/MCRFileNodeServlet/wias_derivate_00003206/wias_preprints_2785.pdf; http://www.wias-berlin.de/publications/wias-publ/run.jsp?template=abstract&type=Preprint&year=2020&number=2785 |
| Rights: |
all rights reserved ; info:eu-repo/semantics/openAccess |
| Accession Number: |
edsbas.2610F8B7 |
| Database: |
BASE |