| Title: |
LPP EUV source readiness for NXE 3300B |
| Authors: |
Brandt, David C.; Fomenkov, Igor V.; Farrar, Nigel R.; La Fontaine, Bruno; Myers, David W.; Brown, Daniel J.; Ershov, Alex I.; Böwering, Norbert R.; Riggs, Daniel J.; Rafac, Robert J.; De Dea, Silvia; Peeters, Rudy; Meiling, Hans; Harned, Noreen; Smith, Daniel; Pirati, Alberto; Kazinczi, Robert |
| Contributors: |
Wood, Obert R.; Panning, Eric M. |
| Source: |
SPIE Proceedings ; Extreme Ultraviolet (EUV) Lithography V ; volume 9048, page 90480C ; ISSN 0277-786X |
| Publisher Information: |
SPIE |
| Publication Year: |
2014 |
| Document Type: |
conference object |
| Language: |
unknown |
| DOI: |
10.1117/12.2048184 |
| Availability: |
https://doi.org/10.1117/12.2048184 |
| Accession Number: |
edsbas.2A80F95A |
| Database: |
BASE |