| Title: |
Magnetic-field-enhanced rf argon plasma for ionized sputtering of copper |
| Authors: |
Wang, Weitung; Foster, John; Wendt, Amy E.; Booske, John H.; Onuoha, Tina; Sandstrom, Perry W.; Liu, Henley L.; Gearhart, Steven S.; Hershkowitz, Noah |
| Publisher Information: |
American Institute of Physics |
| Publication Year: |
2007 |
| Collection: |
University of Wisconsin: Digital Collections |
| Description: |
This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder. |
| Document Type: |
article in journal/newspaper |
| File Description: |
57337 bytes; application/pdf |
| Language: |
unknown |
| Relation: |
http://www.aip.org; http://apl.aip.org/; http://digital.library.wisc.edu/1793/10944 |
| Availability: |
http://digital.library.wisc.edu/1793/10944 |
| Rights: |
Copyright 1997 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. |
| Accession Number: |
edsbas.2AB6799C |
| Database: |
BASE |