| Title: |
Performance overview and outlook of EUV lithography systems |
| Authors: |
Pirati, Alberto; Peeters, Rudy; Smith, Daniel; Lok, Sjoerd; Minnaert, Arthur; van Noordenburg, Martijn; Mallmann, Jörg; Harned, Noreen; Stoeldraijer, Judon; Wagner, Christian; Zoldesi, Carmen; van Setten, Eelco; Finders, Jo; de Peuter, Koen; de Ruijter, Chris; Popadic, Milos; Huang, Roger; Lin, Martin; Chuang, Frank; van Es, Roderik; Beckers, Marcel; Brandt, David; Farrar, Nigel; Schafgans, Alex; Brown, Daniel; Boom, Herman; Meiling, Hans; Kool, Ron |
| Contributors: |
Wood, Obert R.; Panning, Eric M. |
| Source: |
SPIE Proceedings ; Extreme Ultraviolet (EUV) Lithography VI ; volume 9422, page 94221P ; ISSN 0277-786X |
| Publisher Information: |
SPIE |
| Publication Year: |
2015 |
| Document Type: |
conference object |
| Language: |
unknown |
| DOI: |
10.1117/12.2085912 |
| Availability: |
https://doi.org/10.1117/12.2085912 |
| Accession Number: |
edsbas.2BA88342 |
| Database: |
BASE |