| Title: |
0.33 NA EUV systems for high-volume manufacturing |
| Authors: |
Smeets, Christophe; Van Es, Roderik; De Graaf, Roelof; Levasier, Leon; Mastenbroek, Marcel; Verhoeven, Eric |
| Contributors: |
Ronse, Kurt G.; Gargini, Paolo A.; Hendrickx, Eric; Naulleau, Patrick P.; Itani, Toshiro |
| Source: |
International Conference on Extreme Ultraviolet Lithography 2021 ; page 28 |
| Publisher Information: |
SPIE |
| Publication Year: |
2021 |
| Document Type: |
conference object |
| Language: |
unknown |
| DOI: |
10.1117/12.2600961 |
| Availability: |
https://doi.org/10.1117/12.2600961 |
| Accession Number: |
edsbas.2C171CD1 |
| Database: |
BASE |