| Title: |
Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications |
| Authors: |
Serra, Enrico; Borrielli, Antonio Lorenzo; Bonaldi, Michele; Bawaj, M.; Di Giuseppe, G.; Forte, S.; Kralj, N.; Malossi, N.; Marconi, L.; Marin, F.; Marino, F.; Morana, B.; Natali, R.; Pandraud, G.; Pontin, A.; Prodi, G. A.; Rossi, M.; Sarro, P. M.; Vitali, D. |
| Contributors: |
Serra, Enrico; Bawaj, M.; Borrielli, Antonio Lorenzo; Di Giuseppe, G.; Forte, S.; Kralj, N.; Malossi, N.; Marconi, L.; Marin, F.; Marino, F.; Morana, B.; Natali, R.; Pandraud, G.; Pontin, A.; Prodi, G. A.; Rossi, M.; Sarro, P. M.; Vitali, D.; Bonaldi, Michele |
| Publication Year: |
2016 |
| Collection: |
Fondazione Bruno Kessler: CINECA IRIS |
| Subject Terms: |
Quantum optic; SiNx membranes |
| Description: |
In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michel- son interferometer, where Q values up to 1.3 × 10^6 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical nesse up to 50000 has been observed. |
| Document Type: |
article in journal/newspaper |
| File Description: |
ELETTRONICO |
| Language: |
English |
| Relation: |
info:eu-repo/semantics/altIdentifier/wos/WOS:000379041400004; volume:6; firstpage:065004; numberofpages:8; journal:AIP ADVANCES; https://hdl.handle.net/11582/304453; http://scitation.aip.org/content/aip/journal/adva/6/6/10.1063/1.4953805?TRACK=RSS |
| DOI: |
10.1063/1.4953805 |
| DOI: |
10.1063/1.4953805?TRACK=RSS |
| Availability: |
https://hdl.handle.net/11582/304453; https://doi.org/10.1063/1.4953805; http://scitation.aip.org/content/aip/journal/adva/6/6/10.1063/1.4953805?TRACK=RSS |
| Rights: |
info:eu-repo/semantics/openAccess |
| Accession Number: |
edsbas.2F7569D |
| Database: |
BASE |