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Applications of highly non-equilibrium low-pressure oxygen plasma for treatment of polymers and polymer composites on an industrial scale

Title: Applications of highly non-equilibrium low-pressure oxygen plasma for treatment of polymers and polymer composites on an industrial scale
Authors: Vesel, A; Primc, G; Zaplotnik, R; Mozetič, M
Contributors: Javna Agencija za Raziskovalno Dejavnost RS
Source: Plasma Physics and Controlled Fusion ; volume 62, issue 2, page 024008 ; ISSN 0741-3335 1361-6587
Publisher Information: IOP Publishing
Publication Year: 2020
Description: Scientific aspects of technologies based on application of non-equilibrium oxygen plasma are presented. Oxygen plasma is sustained by an electrodeless discharge to facilitate a high concentration of neutral reactive species, in particular O atoms. The species interact with solid materials causing surface functionalization, removal or organic impurities, nanostructuring of polymers, selective etching of polymer composites or synthesis of metal-oxide nanoparticles. The flux of O atoms onto the surface-facing plasma is often between 10 20 and 10 23 m −2 s −1 . While the physical interaction with solid materials (i.e. heterogeneous surface recombination) does not depend much on the sample temperature, the chemical interactions (functionalization, etching, oxidation) increase significantly with increasing temperature. The key treatment parameters are therefore the fluence of O atoms onto the sample surface and its temperature. The recommended ranges of parameters for various technologies are shown in the graphical abstract.
Document Type: article in journal/newspaper
Language: unknown
DOI: 10.1088/1361-6587/ab5b50
DOI: 10.1088/1361-6587/ab5b50/pdf
Availability: https://doi.org/10.1088/1361-6587/ab5b50; https://iopscience.iop.org/article/10.1088/1361-6587/ab5b50; https://iopscience.iop.org/article/10.1088/1361-6587/ab5b50/pdf
Rights: http://creativecommons.org/licenses/by/3.0/ ; https://iopscience.iop.org/info/page/text-and-data-mining
Accession Number: edsbas.3CB29065
Database: BASE