| Title: |
Laser produced plasma EUV sources for device development and HVM |
| Authors: |
Brandt, David C.; Fomenkov, Igor V.; Lercel, Michael J.; La Fontaine, Bruno M.; Myers, David W.; Brown, Daniel J.; Ershov, Alex I.; Sandstrom, Richard L.; Bykanov, Alexander N.; Vaschenko, Georgiy O.; Böwering, Norbert R.; Das, Palash; Fleurov, Vladimir B.; Zhang, Kevin; Srivastava, Shailendra N.; Ahmad, Imtiaz; Rajyaguru, Chirag; De Dea, Silvia; Dunstan, Wayne J.; Baumgart, Peter; Ishihara, Toshi; Simmons, Rod D.; Jacques, Robert N.; Bergstedt, Robert A.; Porshnev, Peter I.; Wittak, Christian J.; Woolston, Michael R.; Rafac, Robert J.; Grava, Jonathan; Schafgans, Alexander A.; Tao, Yezheng |
| Contributors: |
Naulleau, Patrick P.; Wood II, Obert R. |
| Source: |
SPIE Proceedings ; Extreme Ultraviolet (EUV) Lithography III ; volume 8322, page 83221I ; ISSN 0277-786X |
| Publisher Information: |
SPIE |
| Publication Year: |
2012 |
| Document Type: |
conference object |
| Language: |
unknown |
| DOI: |
10.1117/12.916521 |
| Availability: |
https://doi.org/10.1117/12.916521; http://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.916521 |
| Accession Number: |
edsbas.473FD725 |
| Database: |
BASE |