| Title: |
UV-assisted nanoimprint lithography: the impact of loading effect in silicon on nanoscale pattern of metalens |
| Authors: |
Alankhli, Zahrah; Li, Xiaohang; Lin, Zhiyuan; AlQatari, Feras; Cao, Haicheng |
| Contributors: |
Lu, Yu-Jung; Tanaka, Takuo |
| Source: |
Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XXII ; page 79 |
| Publisher Information: |
SPIE |
| Publication Year: |
2024 |
| Document Type: |
conference object |
| Language: |
unknown |
| DOI: |
10.1117/12.3029471 |
| Availability: |
https://doi.org/10.1117/12.3029471 |
| Accession Number: |
edsbas.4A324A80 |
| Database: |
BASE |