| Title: |
EUV lithography performance for manufacturing: status and outlook |
| Authors: |
Pirati, Alberto; Peeters, Rudy; Smith, Daniel; Lok, Sjoerd; van Noordenburg, Martijn; van Es, Roderik; Verhoeven, Eric; Meijer, Henk; Minnaert, Arthur; van der Horst, Jan-Willem; Meiling, Hans; Mallmann, Joerg; Wagner, Christian; Stoeldraijer, Judon; Fisser, Geert; Finders, Jo; Zoldesi, Carmen; Stamm, Uwe; Boom, Herman; Brandt, David; Brown, Daniel; Fomenkov, Igor; Purvis, Michael |
| Contributors: |
Panning, Eric M.; Goldberg, Kenneth A. |
| Source: |
SPIE Proceedings ; Extreme Ultraviolet (EUV) Lithography VII ; volume 9776, page 97760A ; ISSN 0277-786X |
| Publisher Information: |
SPIE |
| Publication Year: |
2016 |
| Document Type: |
conference object |
| Language: |
unknown |
| DOI: |
10.1117/12.2220423 |
| Availability: |
https://doi.org/10.1117/12.2220423 |
| Accession Number: |
edsbas.4FFC3ADC |
| Database: |
BASE |