| Title: |
EUV lithography: NXE platform performance overview |
| Authors: |
Peeters, Rudy; Lok, Sjoerd; Mallman, Joerg; van Noordenburg, Martijn; Harned, Noreen; Kuerz, Peter; Lowisch, Martin; van Setten, Eelco; Schiffelers, Guido; Pirati, Alberto; Stoeldraijer, Judon; Brandt, David; Farrar, Nigel; Fomenkov, Igor; Boom, Herman; Meiling, Hans; Kool, Ron |
| Contributors: |
Wood, Obert R.; Panning, Eric M. |
| Source: |
SPIE Proceedings ; Extreme Ultraviolet (EUV) Lithography V ; volume 9048, page 90481J ; ISSN 0277-786X |
| Publisher Information: |
SPIE |
| Publication Year: |
2014 |
| Document Type: |
conference object |
| Language: |
unknown |
| DOI: |
10.1117/12.2046909 |
| Availability: |
https://doi.org/10.1117/12.2046909 |
| Accession Number: |
edsbas.72242964 |
| Database: |
BASE |