| Title: |
EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update |
| Authors: |
van de Kerkhof, Mark A.; Minnaert, Arthur W. E.; Pieters, Marco; Meiling, Hans; Smits, Joost; Peeters, Rudy; van Es, Roderik; Fisser, Geert; de Klerk, Jos W.; Moors, Roel; Verhoeven, Eric; Levasier, Leon |
| Contributors: |
Felix, Nelson M.; Goldberg, Kenneth A. |
| Source: |
Extreme Ultraviolet (EUV) Lithography IX ; page 13 |
| Publisher Information: |
SPIE |
| Publication Year: |
2018 |
| Document Type: |
conference object |
| Language: |
unknown |
| DOI: |
10.1117/12.2299503 |
| Availability: |
https://doi.org/10.1117/12.2299503 |
| Accession Number: |
edsbas.76D04CF2 |
| Database: |
BASE |