UV-assisted nanoimprint lithography: the impact of the loading effect in silicon on nanoscale patterns of metalens
| Title: | UV-assisted nanoimprint lithography: the impact of the loading effect in silicon on nanoscale patterns of metalens |
|---|---|
| Authors: | Alnakhli, Zahrah; Liu, Zhiyuan; AlQatari, Feras; Cao, Haicheng; Li, Xiaohang |
| Contributors: | Global Collaborative Research, King Abdullah University of Science and Technology; King Abdullah University of Science and Technology |
| Source: | Nanoscale Advances ; volume 6, issue 11, page 2954-2967 ; ISSN 2516-0230 |
| Publisher Information: | Royal Society of Chemistry (RSC) |
| Publication Year: | 2024 |
| Description: | This work studies the impact of the silicon (Si) loading effect induced by deep reactive ion etching (DRIE) of silicon master molds on the UV-nanoimprint lithography (NIL) patterning of nanofeatures. |
| Document Type: | article in journal/newspaper |
| Language: | English |
| DOI: | 10.1039/d4na00120f |
| Availability: | https://doi.org/10.1039/d4na00120f; http://pubs.rsc.org/en/content/articlepdf/2024/NA/D4NA00120F |
| Rights: | http://creativecommons.org/licenses/by-nc/3.0/ |
| Accession Number: | edsbas.7FAD7896 |
| Database: | BASE |