| Title: |
Surface etching, chemical modification and characterization of silicon nitride and silicon oxide—selective functionalization of Si 3 N 4 and SiO 2 |
| Authors: |
Liu, Li-Hong; Michalak, David J; Chopra, Tatiana P; Pujari, Sidharam P; Cabrera, Wilfredo; Dick, Don; Veyan, Jean-François; Hourani, Rami; Halls, Mathew D; Zuilhof, Han; Chabal, Yves J |
| Contributors: |
National Science Foundation; Semiconductor Research Corporation; Intel Corporation |
| Source: |
Journal of Physics: Condensed Matter ; volume 28, issue 9, page 094014 ; ISSN 0953-8984 1361-648X |
| Publisher Information: |
IOP Publishing |
| Publication Year: |
2016 |
| Document Type: |
article in journal/newspaper |
| Language: |
unknown |
| DOI: |
10.1088/0953-8984/28/9/094014 |
| Availability: |
https://doi.org/10.1088/0953-8984/28/9/094014; http://stacks.iop.org/0953-8984/28/i=9/a=094014/pdf; http://stacks.iop.org/0953-8984/28/i=9/a=094014?key=crossref.27893babc7aeb28fa1b12ecd1f303ec1; http://stacks.iop.org/0953-8984/28/i=9/a=094014/ampdf |
| Rights: |
http://iopscience.iop.org/info/page/text-and-data-mining ; http://iopscience.iop.org/page/copyright ; http://creativecommons.org/licenses/by-nc-nd/3.0 |
| Accession Number: |
edsbas.84F5AAC3 |
| Database: |
BASE |