| Title: |
Critical dimension uniformity characterization of nanoimprinted trenches for high volume manufacturing qualification |
| Authors: |
Teyssedre, H.; Landis, S.; Thanner, C.; Schauer, V.; Laure, M.; Zorbach, W.; Pain, L.; Bos, S.; Eibelhuber, M.; Wimplinger, M. |
| Contributors: |
Behringer, Uwe F.W.; Finders, Jo |
| Source: |
SPIE Proceedings ; 32nd European Mask and Lithography Conference ; volume 10032, page 100320M ; ISSN 0277-786X |
| Publisher Information: |
SPIE |
| Publication Year: |
2016 |
| Document Type: |
conference object |
| Language: |
unknown |
| DOI: |
10.1117/12.2250194 |
| Availability: |
https://doi.org/10.1117/12.2250194 |
| Accession Number: |
edsbas.8687684F |
| Database: |
BASE |