| Title: |
Hole Injection and Rectifying Heterojunction Photodiodes through Vacancy Engineering in MoS2 |
| Authors: |
Bhattacharjee, S; Vatsyayan, R; Ganapathi, KL; Ravindra, P; Bhat, N; Mohan, S |
| Publisher Information: |
Wiley |
| Publication Year: |
2019 |
| Collection: |
Indian Institute of Science, Bangalore: ePrints@IIsc |
| Subject Terms: |
Centre for Nano Science and Engineering |
| Description: |
The lack of techniques for counter doping in two dimensional (2D) semiconductors has hindered the development of p/n junctions, which are the basic building blocks of electronic devices. In this work, low‐energy argon ions are used to create sulfur vacancies and are subsequently “filled” with oxygen to create p‐doped MoS2−xOx. The incorporation of oxygen into the MoS2 lattice and hence band‐structure modification reveal the nature of the p‐type doping. These changes are validated by X‐ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, Raman spectroscopy, and photoluminescence measurements combined with density functional theory calculations. Electrical measurements reveal a complete flip in carrier polarity from n‐type to p‐type, which is further examined using temperature‐dependent transport measurements. The enhancement of p‐field‐effect transistor characteristics is facilitated by employing top‐gated transistors and area‐selective vacancy engineering only in the contact regions. Finally, on the same flake, an in‐plane MoS2 (n)/MoS2−xOx (p) type‐I (straddling) heterojunction with rectifying behavior and excellent broadband photoresponse is demonstrated and explained using band diagrams. The spatial/metallurgical abruptness ( |
| Document Type: |
article in journal/newspaper |
| File Description: |
application/pdf |
| Language: |
English |
| Relation: |
http://eprints.iisc.ac.in/63344/1/Adv_Ele_Mat_5-6_2019.pdf; Bhattacharjee, S and Vatsyayan, R and Ganapathi, KL and Ravindra, P and Bhat, N and Mohan, S (2019) Hole Injection and Rectifying Heterojunction Photodiodes through Vacancy Engineering in MoS2. In: ADVANCED ELECTRONIC MATERIALS, 5 (6). |
| DOI: |
10.1002/aelm.201800863 |
| Availability: |
http://eprints.iisc.ac.in/63344/; https://doi.org/10.1002/aelm.201800863; http://eprints.iisc.ac.in/63344/1/Adv_Ele_Mat_5-6_2019.pdf |
| Accession Number: |
edsbas.88A38C37 |
| Database: |
BASE |