| Title: |
0.33 NA EUV systems for high-volume manufacturing |
| Authors: |
Verhoeven, Eric; Schuurhuis, Ron; Mastenbroek, Marcel; Jonkers, Peter; Bornebroek, Frank; Minnaert, Arthur; Van Dijck, Harrie; Yaghoobi, Parham; Fisser, Geert; Tayebati, Payam; Hummler, Klaus; Van Es, Roderik |
| Contributors: |
Felix, Nelson M.; Lio, Anna |
| Source: |
Extreme Ultraviolet (EUV) Lithography XII ; page 6 |
| Publisher Information: |
SPIE |
| Publication Year: |
2021 |
| Document Type: |
conference object |
| Language: |
unknown |
| DOI: |
10.1117/12.2583992 |
| Availability: |
https://doi.org/10.1117/12.2583992 |
| Accession Number: |
edsbas.96D7C725 |
| Database: |
BASE |