| Title: |
EUV lithography at the 22nm technology node |
| Authors: |
Wood, Obert; Koay, Chiew-Seng; Petrillo, Karen; Mizuno, Hiroyuki; Raghunathan, Sudhar; Arnold, John; Horak, Dave; Burkhardt, Martin; McIntyre, Gregory; Deng, Yunfei; La Fontaine, Bruno; Okoroanyanwu, Uzo; Wallow, Tom; Landie, Guillaume; Standaert, Theodorus; Burns, Sean; Waskiewicz, Christopher; Kawasaki, Hirohisa; Chen, James H.-C.; Colburn, Matthew; Haran, Bala; Fan, Susan S.-C.; Yin, Yunpeng; Holfeld, Christian; Techel, Jens; Peters, Jan-Hendrik; Bouten, Sander; Lee, Brian; Pierson, Bill; Kessels, Bart; Routh, Robert; Cummings, Kevin |
| Contributors: |
La Fontaine, Bruno M. |
| Source: |
SPIE Proceedings ; Extreme Ultraviolet (EUV) Lithography ; volume 7636, page 76361M ; ISSN 0277-786X |
| Publisher Information: |
SPIE |
| Publication Year: |
2010 |
| Document Type: |
conference object |
| Language: |
unknown |
| DOI: |
10.1117/12.847049 |
| Availability: |
https://doi.org/10.1117/12.847049 |
| Accession Number: |
edsbas.A27501CA |
| Database: |
BASE |