| Title: |
0.33 NA EUV systems for High Volume Manufacturing |
| Authors: |
Verhoeven, Eric; Schuurhuis, Ron; Mastenbroek, Marcel; Jonkers, Peter; Bornebroek, Frank; Minnaert, Arthur; van Dijck, Harrie; Yaghoobi, Parham; Fisser, Geert; Tayebati, Payam; Leenders, Martijn; van Es, Roderik |
| Contributors: |
Ronse, Kurt G.; Gargini, Paolo A.; Naulleau, Patrick P.; Itani, Toshiro |
| Source: |
Extreme Ultraviolet Lithography 2020 ; page 1 |
| Publisher Information: |
SPIE |
| Publication Year: |
2020 |
| Document Type: |
conference object |
| Language: |
unknown |
| DOI: |
10.1117/12.2572356 |
| Availability: |
https://doi.org/10.1117/12.2572356 |
| Accession Number: |
edsbas.A743952 |
| Database: |
BASE |