| Title: |
Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner |
| Authors: |
van de Kerkhof, Mark; Jasper, Hans; Levasier, Leon; Peeters, Rudy; van Es, Roderik; Bosker, Jan-Willem; Zdravkov, Alexander; Lenderink, Egbert; Evangelista, Fabrizio; Broman, Par; Bilski, Bartosz; Last, Thorsten |
| Contributors: |
Panning, Eric M.; Goldberg, Kenneth A. |
| Source: |
SPIE Proceedings ; Extreme Ultraviolet (EUV) Lithography VIII ; volume 10143, page 101430D ; ISSN 0277-786X |
| Publisher Information: |
SPIE |
| Publication Year: |
2017 |
| Document Type: |
conference object |
| Language: |
unknown |
| DOI: |
10.1117/12.2258025 |
| Availability: |
https://doi.org/10.1117/12.2258025 |
| Accession Number: |
edsbas.D602C3CA |
| Database: |
BASE |