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Xanthopinacol Boronate: A Robust, Photochemically Assembled and Cleavable Boronic Ester for Orthogonal Chemistry

Title: Xanthopinacol Boronate: A Robust, Photochemically Assembled and Cleavable Boronic Ester for Orthogonal Chemistry
Authors: Heard, David M.; Lessard, Martin C.; Hall, Dennis G.
Source: Angewandte Chemie International Edition ; volume 64, issue 28 ; ISSN 1433-7851 1521-3773
Publisher Information: Wiley
Publication Year: 2025
Collection: Wiley Online Library (Open Access Articles via Crossref)
Description: Organoboronic acids impact numerous fields of application from organic synthesis to drug discovery and materials science. However, their highly polar nature makes them challenging to handle, purify, and characterize. Boronic esters help overcome these issues, and pinacol esters (Bpin) have become the dominant boronic acid surrogate in organic synthesis. Despite its popularity, Bpin is not without drawbacks. Its formation from pinacol is intrinsically reversible in the presence of water or alcohols, which may cause premature release leading to losses during reactions and purification. This reversibility complicates the hydrolytic regeneration of free boronic acids, which often requires additional steps to destroy the pinacol by‐product. Although other boronyl protecting groups exist, their removal requires harsh pH conditions. To address these issues, we developed xanthopinacol boronates (Bxpin), a robust protecting group for boronic acids with excellent orthogonality in various chemical reactions and mild irreversible removal under catalyzed photoredox conditions. Xpin boronates can be obtained directly by irradiation of a mixture of free boronic acid and xanthone with UV light, causing an in situ dimerization of xanthone to the required xanthopinacol. The unique attributes of xpin boronates were further studied by UV–vis spectrophotometry, X‐ray crystallography, cyclic voltammetry, and various stability tests.
Document Type: article in journal/newspaper
Language: English
DOI: 10.1002/anie.202507571
Availability: https://doi.org/10.1002/anie.202507571; https://onlinelibrary.wiley.com/doi/pdf/10.1002/anie.202507571
Rights: http://creativecommons.org/licenses/by-nc-nd/4.0/
Accession Number: edsbas.DAEE2B90
Database: BASE