Electrical activation of solid-phase epitaxially regrown ultra-low energy boron implants in Ge preamorphised silicon and SOI
| Title: | Electrical activation of solid-phase epitaxially regrown ultra-low energy boron implants in Ge preamorphised silicon and SOI |
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| Authors: | Hamilton, JJ; Collart, EJH; Colombeau, B; Jeynes, C; Bersani, M; Giubertoni, D; Sharp, JA; Cowern, NEB; Kirkby, KJ |
| Publication Year: | 2005 |
| Collection: | University of Surrey, Guildford: Surrey Scholarship Online. |
| Document Type: | conference object |
| Language: | unknown |
| Relation: | http://epubs.surrey.ac.uk/831640/; Hamilton, JJ, Collart, EJH, Colombeau, B, Jeynes, C, Bersani, M, Giubertoni, D, Sharp, JA, Cowern, NEB and Kirkby, KJ (2005) Electrical activation of solid-phase epitaxially regrown ultra-low energy boron implants in Ge preamorphised silicon and SOI In: 15th International Conference on Ion Implantation Technology, 2004-10-25 - 2004-10-27, Taipei, TAIWAN. |
| DOI: | 10.1016/j.nimb.2005.04.112 |
| Availability: | https://doi.org/10.1016/j.nimb.2005.04.112 |
| Accession Number: | edsbas.E1F00A49 |
| Database: | BASE |