Electron beam lithography tests on EM Resist’s new 32%-HSQ resist formulation
| Title: | Electron beam lithography tests on EM Resist’s new 32%-HSQ resist formulation |
|---|---|
| Authors: | Deblock, Yves; Tilmant, Pascal; Vaillard, Anne-Sophie; Boyaval, Christophe; Ouendi, Saliha; Brouillard, Mélanie; Elegbe, James |
| Contributors: | Centrale de Micro Nano Fabrication - IEMN CMNF - IEMN |
| Publication Year: | 2025 |
| Collection: | LillOA (Lille Open Archive - Université de Lille) |
| Subject Terms: | resist formulation; 32%-HSQ; EM Resist; Electron beam lithography |
| Document Type: | conference object |
| File Description: | application/octet-stream |
| Language: | English |
| Relation: | 2025 Renatech+ Lithography and Etching Days |
| Availability: | https://lilloa.univ-lille.fr/handle/20.500.12210/131389; https://hdl.handle.net/20.500.12210/131389 |
| Rights: | info:eu-repo/semantics/openAccess |
| Accession Number: | edsbas.E80BBB27 |
| Database: | BASE |