| Title: |
Fabrication of single-electron shuttling channels in a silicon CMOS fab using high-throughput electron beam lithography |
| Authors: |
Langheinrich, Wolfram; Brackmann, Varvara; Schreiber, Lars R.; Bluhm, Jörg; Friedrich, Michael; Wislicenus, Marcus; Muster, Pascal; Pregl, Sebastian; Reichmann, Felix; Komerički, Nikola; Bougeard, Dominique; Huckemann, Till |
| Source: |
SPIE, Proceedings of SPIE 13787, 6 Seiten (2025). doi:10.1117/12.3063352 ; 40th European Mask and Lithography Conference (EMLC 2025) : 16–18 June 2025, Dresden, Germany / Jo Finders, Ines Stolberg Editors ; Organized by VDE/VDI GMM – The Society of Microelectronics, Microsystems, and Precision Engineering (Germany) ; Organized by VDE/VDI GMM – The Society of Microelectronics, Microsystems, and Precision Engineering (Germany) 40. European Mask and Lithography Conference, EMLC 2025, Dresden, Germany, 2025-06-16 - 2025-06-18 |
| Publisher Information: |
SPIE |
| Publication Year: |
2025 |
| Collection: |
RWTH Aachen University: RWTH Publications |
| Subject Geographic: |
DE |
| Document Type: |
conference object |
| Language: |
English |
| ISSN: |
1996-756X; 0277-786X |
| Relation: |
info:eu-repo/semantics/altIdentifier/isbn/9781510694545; info:eu-repo/semantics/altIdentifier/issn/1996-756X; info:eu-repo/semantics/altIdentifier/wos/WOS:001697778800014; info:eu-repo/semantics/altIdentifier/issn/0277-786X; info:eu-repo/semantics/altIdentifier/isbn/9781510694538 |
| Availability: |
https://publications.rwth-aachen.de/record/1032493; https://publications.rwth-aachen.de/search?p=id:%22RWTH-2026-03571%22 |
| Rights: |
info:eu-repo/semantics/closedAccess |
| Accession Number: |
edsbas.F210EB4B |
| Database: |
BASE |