| Title: |
How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning |
| Authors: |
Neisser, Mark; Orji, Ndubuisi G.; Levinson, Harry J.; Celano, Umberto; Moyne, James; Mashiro, Supika; Wilcox, Dan; Libman, Slava |
| Source: |
Computer ; volume 57, issue 1, page 51-58 ; ISSN 0018-9162 1558-0814 |
| Publisher Information: |
Institute of Electrical and Electronics Engineers (IEEE) |
| Publication Year: |
2024 |
| Document Type: |
article in journal/newspaper |
| Language: |
unknown |
| DOI: |
10.1109/mc.2023.3312767 |
| Availability: |
https://doi.org/10.1109/mc.2023.3312767; http://xplorestaging.ieee.org/ielx7/2/10380233/10380237.pdf?arnumber=10380237 |
| Rights: |
https://ieeexplore.ieee.org/Xplorehelp/downloads/license-information/IEEE.html ; https://doi.org/10.15223/policy-029 ; https://doi.org/10.15223/policy-037 |
| Accession Number: |
edsbas.F7B5607 |
| Database: |
BASE |