| Title: |
Rules-based correction strategies setup on sub-micrometer line and space patterns for 200mm wafer scale SmartNIL process within an integration process flow |
| Authors: |
Teyssedre, H.; Landis, S.; Brianceau, P.; Mayr, M.; Thanner, C.; Laure, M.; Zorbach, W.; Eibelhuber, M.; Pain, L.; Chouiki, M.; Wimplinger, M. |
| Contributors: |
Bencher, Christopher; Cheng, Joy Y. |
| Source: |
SPIE Proceedings ; Emerging Patterning Technologies ; volume 10144, page 101440V ; ISSN 0277-786X |
| Publisher Information: |
SPIE |
| Publication Year: |
2017 |
| Document Type: |
conference object |
| Language: |
unknown |
| DOI: |
10.1117/12.2260002 |
| Availability: |
https://doi.org/10.1117/12.2260002 |
| Accession Number: |
edsbas.F84466D4 |
| Database: |
BASE |