Optimal phase conflict removal for layout of dark field alternating phase shifting masks
| Title: | Optimal phase conflict removal for layout of dark field alternating phase shifting masks |
|---|---|
| Authors: | Berman, Piotr; Kahng, Andrew B.; Vidhani, Devendra; Wang, Huijuan; Zelikovsky, Alex |
| Source: | Proceedings of the 1999 international symposium on Physical design. :121-126 |
| Availability: | http://dl.acm.org/doi/10.1145/299996.300037 |
| Database: | ACM Full-Text Collection |