| Title: |
CMOS Demonstration of Negative Capacitance HfO2-ZrO2 Superlattice Gate Stack in a Self-Aligned, Replacement Gate Process |
| Authors: |
Shanker, N.; Cook, M.; Cheema, S.S.; Li, W.; Rastogi, R.; Pipitone, D.; Chen, C.; Smith, M.; Meninger, S.; Bauer, F.; Pinelli, G.; Hunt, J.; Salahuddin, S.; Mohamed, M. |
| Source: |
2022 International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2022 International. :34.3.1-34.3.4 Dec, 2022 |
| Relation: |
2022 IEEE International Electron Devices Meeting (IEDM) |
| Database: |
IEEE Xplore Digital Library |