Improve photomask writing error using Registration Correction (RegC) technology
| Title: | Improve photomask writing error using Registration Correction (RegC) technology |
|---|---|
| Authors: | Zeng, Yilei; Tang, Levi; Wang, Yingjie; Chen, Kun; Liu, Adam; Zhang, Claire |
| Source: | 2023 International Workshop on Advanced Patterning Solutions (IWAPS) Advanced Patterning Solutions (IWAPS), 2023 International Workshop on. :1-4 Oct, 2023 |
| Relation: | 2023 International Workshop on Advanced Patterning Solutions (IWAPS) |
| Database: | IEEE Xplore Digital Library |