Enhancement of Selectivity for Chemical Mechanical Polishing by Ultra-High-Dose C and Si Ion Implantation
| Title: | Enhancement of Selectivity for Chemical Mechanical Polishing by Ultra-High-Dose C and Si Ion Implantation |
|---|---|
| Authors: | Yuan, S.; Omori, K.; Yamaguchi, T.; Ide, T.; Muranaka, S.; Inoue, M. |
| Source: | IEEE Journal of the Electron Devices Society IEEE J. Electron Devices Soc. Electron Devices Society, IEEE Journal of the. 12:407-414 2024 |
| Database: | IEEE Xplore Digital Library |