Development of 1.6 μm Fine-Pitch RDL Damascene Process using Low-NA i-Line Stepper and a New Negative-Tone Photosensitive Dielectric Material
| Title: | Development of 1.6 μm Fine-Pitch RDL Damascene Process using Low-NA i-Line Stepper and a New Negative-Tone Photosensitive Dielectric Material |
|---|---|
| Authors: | Wang, Lili; Pak, Murat; Inoue, Go; Shibasaki, Kaho; Okuda, Ayano; Sugita, Kenyu; Ishikawa, Nobuhiro; Ogata, Toshiyuki; Miller, Andy; Beyne, Eric |
| Source: | 2025 IEEE CPMT Symposium Japan (ICSJ) CPMT Symposium Japan (ICSJ), 2025 IEEE. :92-95 Nov, 2025 |
| Relation: | 2025 IEEE CPMT Symposium Japan (ICSJ) |
| Database: | IEEE Xplore Digital Library |