| Title: |
300mm fabrication of silicon quantum dot spin qubits using 0.33NA EUV lithography |
| Authors: |
Beyne, S.; Kubicek, S.; Godfrin, C.; Raes, B.; Van Caekenberghe, T.; De Backer, J.; Hermans, Y.; Treska, F.; Kaushik, S.; Jiang, Y.; Chou, B.; Sarkar, T.; Li, Y.; Sharma, S.; Baudot, S.; Pinotti, L.; Shimura, Y.; Loo, R.; Kenens, B.; Vande Weeghde, J.; Vrancken, E.; Vandersmissen, K.; Mitard, J.; Devriendt, K.; Wan, D.; De Greve, K. |
| Source: |
2025 IEEE International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2025 IEEE International. :1-4 Dec, 2025 |
| Relation: |
2025 IEEE International Electron Devices Meeting (IEDM) |
| Database: |
IEEE Xplore Digital Library |