| Title: |
Novel Low Temperature SiO2 Formation Process by Oxygen and Hydrogen Radicals for Core and I/O RMG Stacks: Achieving the Ultimate NBTI Reliability with a Charge-Free IL |
| Authors: |
Franco, J.; Arimura, H.; Bastos, J. P.; Afanas'Ev, V.; De Marneffe, J.-F.; Kim, M.-S.; Kaczer, B.; Horiguchi, N. |
| Source: |
2025 IEEE International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2025 IEEE International. :1-4 Dec, 2025 |
| Relation: |
2025 IEEE International Electron Devices Meeting (IEDM) |
| Database: |
IEEE Xplore Digital Library |