| Title: |
Selective etch process for fab-compatible top contacts, replacement oxide, and interlayer removal in 2D FETs |
| Authors: |
Smets, Q.; Schram, T.; van Dorp, D.; Jiang, Y.; Opdebeeck, A.; Cott, D.; Sebaai, F.; Morin, P.; Govoreanu, B.; Panarella, L.; Kozhakhmetov, A.; Dorow, C. J.; Oni, A.; O'Brien, K. P.; Avci, U.; Lockhart De La Rosa, C. J.; Kar, G. S. |
| Source: |
2025 IEEE International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2025 IEEE International. :1-4 Dec, 2025 |
| Relation: |
2025 IEEE International Electron Devices Meeting (IEDM) |
| Database: |
IEEE Xplore Digital Library |