| Title: |
Next-generation Embedded Decoupling Capacitors for Advanced CMOS Technology: from Ferroelectrics to Ultra High-k Dielectrics |
| Authors: |
Chang, S. -C.; Neumann, C.; Rajeeva, B. Bangalore; Jaikissoon, M.; Neilson, K.; Oguz, K.; Tung, I. -C.; Lee, S.; Jezewski, C.; Allen, G.; Hoff, T.; Adams, D.; Jordan, R.; Khora, E.; Bedoya, F.; Bielefeld, J.; Barley, B.; Winslow, C.; Pearce, R.; Kim, H.; Alat, E.; Smith, Q.; Lin, C. -Y.; Wu, W.; Azad, I.; Alcantara, J.; Alpizar, B. Granados; Butzen, N.; Oni, A.; Clendenning, S. B.; Tronic, T.; Pelto, C.; Metz, M.; Avci, U. |
| Source: |
2025 IEEE International Electron Devices Meeting (IEDM) Electron Devices Meeting (IEDM), 2025 IEEE International. :1-4 Dec, 2025 |
| Relation: |
2025 IEEE International Electron Devices Meeting (IEDM) |
| Database: |
IEEE Xplore Digital Library |