Band Engineering of Gate Interlayer for Low-Voltage Operation and Enhanced Reliability in Gate-Injection Type FeFETs
| Title: | Band Engineering of Gate Interlayer for Low-Voltage Operation and Enhanced Reliability in Gate-Injection Type FeFETs |
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| Authors: | Kim, H.; Kim, G.; Choi, H.; Joh, H.; Kang, H.; Park, S.; Seo, K.; Kim, K.; Kim, W.; Ha, D.; Ahn, J.; Jeon, S. |
| Source: | IEEE Electron Device Letters IEEE Electron Device Lett. Electron Device Letters, IEEE. 47(4):728-731 Apr, 2026 |
| Database: | IEEE Xplore Digital Library |