| Title: |
Advanced Full Spectrum Application for Endpoint Optimization in High Aspect Ratio Plasma Etching |
| Authors: |
Chou, Yu-Cheng; Tsai, Canta; Chang, Rem; Wang, Pascal; Chou, Yu-Hsien; Huang, Benjamin |
| Source: |
2026 37th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2026 37th Annual. :1-4 May, 2026 |
| Relation: |
2026 37th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) |
| Database: |
IEEE Xplore Digital Library |