| Title: |
Scaling of high-k dielectrics towards sub-1nm EOT |
| Authors: |
Heyns, M.; Beckx, S.; Bender, H.; Blomme, P.; Boullart, W.; Brijs, B.; Carter, R.; Caymax, M.; Claes, M.; Conard, T.; De Gendt, S.; Degraeve, R.; Delabie, A.; Deweerdt, W.; Groeseneken, G.; Henson, K.; Kauerauf, T.; Kubicek, S.; Lucci, L.; Lujan, G.; Mentens, J.; Pantisano, L.; Petry, J.; Richard, O.; Rohr, E.; Schram, T.; Vandervorst, W.; Van Doorne, P.; Van Elshocht, S.; Westlinder, J.; Witters, T.; Zhao, C.; Cartier, E.; Chen, J.; Cosnier, V.; Green, M.; Jang, S.E.; Kaushik, V.; Kerber, A.; Kluth, J.; Lin, S.; Tsai, W.; Young, E.; Manabe, Y.; Shimamoto, Y.; Bajolet, P.; De Witte, H.; Maes, J.W.; Date, L.; Pique, D.; Coenegrachts, B.; Vertommen, J.; Passefort, S. |
| Source: |
2003 International Symposium on VLSI Technology, Systems and Applications. Proceedings of Technical Papers. (IEEE Cat. No.03TH8672) VLSI technology, systems and applications VLSI Technology, Systems, and Applications, 2003 International Symposium on. :247-250 2003 |
| Relation: |
2003 International Symposium on VLSI Technology, Systems and Applications. Proceedings of Technical Papers |
| Database: |
IEEE Xplore Digital Library |