| Title: |
Implications of halo and well implant conditions on sub-140nm device technologies |
| Authors: |
Foad, M.A.; Doherty, R.; Ito, H.; Matsunaga, Y.; Mitsuda, K.; Honda, M.; Ikeda, S.; Hess, D. |
| Source: |
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on Ion implantation technology proceedings Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on. :369-372 2002 |
| Relation: |
Proceedings of the 2002 14th International Conference on Ion Implantation Technology |
| Database: |
IEEE Xplore Digital Library |