| Title: |
High Volume Manufacturing Ramp In 90nm Dual Stress Liner Technology |
| Authors: |
Gehres, R.; Malik, R.; Amos, R.; Brown, J.; Butt, S.; Chan, A.; Collins, C.; Colwill, B.; Davies, B.; Gabor, A.; Le, N.; Lindo, P.; Mello, K.; Meyette, E.; Nastasi, V.; Patrick, J.; Piper, A.; Prakash, D.P.; Rust, T.; Santiago, A.; Su, T.; Van Roijen, R.; Rutten, M.; Slisher, D.; Tessier, B.; Tetzloff, J.; Wehella-Gamage, D.; Wise, R.; Yang, Q.; Yu, C.; Divakaruni, R.; Goth, G. |
| Source: |
The 17th Annual SEMI/IEEE ASMC 2006 Conference Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE. :411-416 2006 |
| Relation: |
The 17th Annual SEMI/IEEE ASMC 2006 Conference |
| Database: |
IEEE Xplore Digital Library |