| Title: |
Ni-based FUSI gates: CMOS Integration for 45nm node and beyond |
| Authors: |
Hoffmann, T.; Veloso, A.; Lauwers, A.; Yu, H.; Tigelaar, H.; Van Dal, M.; Chiarella, T.; Kerner, C.; Kauerauf, T.; Shickova, A.; Mitsuhashi, R.; Satoru, I.; Niwa, M.; Rothschild, A.; Froment, B.; Ramos, J.; Nackaerts, A.; Rosmeulen, M.; Brus, S.; Vrancken, C.; Absil, P. P.; Jurczak, M.; Biesemans, S.; Kittl, J. A. |
| Source: |
2006 International Electron Devices Meeting Electron Devices Meeting, 2006. IEDM '06. International. :1-4 Dec, 2006 |
| Relation: |
2006 International Electron Devices Meeting |
| Database: |
IEEE Xplore Digital Library |