| Title: |
Localized SOI technology: an innovative Low Cost self-aligned process for Ultra Thin Si-film on thin BOX integration for Low Power applications |
| Authors: |
Monfray, S.; Samson, MP.; Dutartre, D.; Ernst, T.; Rouchouze, E.; Renaud, D.; Guillaumot, B.; Chanemougame, D.; Rabille, G.; Borel, S.; Colonna, JP.; Arvet, C.; Loubet, N.; Campidelli, Y.; Hartmann, JM.; Vandroux, L.; Bensahel, D.; Toffoli, A.; Allain, F.; Margin, A.; Clement, L.; Quiroga, A.; Deleonibus, S.; Skotnicki, T. |
| Source: |
2007 IEEE International Electron Devices Meeting Electron Devices Meeting, 2007. IEDM 2007. IEEE International. :693-696 Dec, 2007 |
| Relation: |
2007 IEEE International Electron Devices Meeting |
| Database: |
IEEE Xplore Digital Library |