Formation and Reduction of Embedded Contamination Defects Detected after FEOL Poly Patterning
| Title: | Formation and Reduction of Embedded Contamination Defects Detected after FEOL Poly Patterning |
|---|---|
| Authors: | Chienfan Yu; Arndt, R.; Ronsheim, P.; St. Lawrence, M.; Hong Lin; Zaitz, M.; Colwill, B.; Bruley, J.; Crispo, G. |
| Source: | The 17th Annual SEMI/IEEE ASMC 2006 Conference Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE. :206-210 2006 |
| Relation: | The 17th Annual SEMI/IEEE ASMC 2006 Conference |
| Database: | IEEE Xplore Digital Library |