| Title: |
A Novel Fluorine Incorporated Band Engineered (BE) Tunnel (SiO2/ HfSiO/ SiO2) TANOS with Excellent Program/Erase & Endurance to 10^5 Cycles |
| Authors: |
Verma, Sarves; Bersuker, Gennadi; Gilmer, David C.; Padovani, Andrea; Park, H.; Nainani, Aneesh; Heh, Dawei; Huang, Jeff; Jiang, Jack; Parat, Krishna; Kirsch, Paul D.; Larcher, Luca; Tseng, Hsing-Huang; Saraswat, Krishna C.; Jammy, R. |
| Source: |
2009 IEEE International Memory Workshop Memory Workshop, 2009. IMW '09. IEEE International. :1-2 May, 2009 |
| Relation: |
2009 IEEE International Memory Workshop (IMW) |
| Database: |
IEEE Xplore Digital Library |