| Title: |
O2 post deposition anneal of Al2O3 blocking dielectric for higher performance and reliability of TANOS Flash memory |
| Authors: |
Rothschild, A.; Breuil, L.; Van den bosch, G.; Richard, O.; Conard, T.; Franquet, A.; Cacciato, A.; Debusschere, I.; Jurczak, M.; Van Houdt, J.; Kittl, J. A.; Ganguly, U.; Date, L.; Boelen, P.; Schreutelkamp, R. |
| Source: |
2009 Proceedings of the European Solid State Device Research Conference Solid State Device Research Conference, 2009. ESSDERC '09. Proceedings of the European. :272-275 Sep, 2009 |
| Relation: |
2009 Proceedings of the European Solid State Device Research Conference (ESSDERC) |
| Database: |
IEEE Xplore Digital Library |