| Title: |
Process Window Centering for 22 nm lithography |
| Authors: |
Buengener, Ralf; Boye, Carol; Rhoads, Bryan N.; Chong, Sang Y.; Tejwani, Charu; Burns, Sean D.; Stamper, Andrew D.; Nafisi, Kourosh; Brodsky, Colin J.; Fan, Susan S.; Kini, Sumanth; Hahn, Roland |
| Source: |
2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) Advanced Semiconductor Manufacturing Conference (ASMC), 2010 IEEE/SEMI. :174-178 Jul, 2010 |
| Relation: |
2010 21st Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) |
| Database: |
IEEE Xplore Digital Library |