| Title: |
Range and damage distributions in ultra-low energy boron implantation into silicon |
| Authors: |
Hatzopoulos, N.; Suder, S.; van den Berg, J.A.; Donnelly, S.E.; Cook, C.E.A.; Armour, D.G.; Panknin, D.; Fukarek, W.; Lucassen, M.; Frey, L.; Foad, M.A.; England, J.G.; Moffatt, S.; Bailey, P.; Noakes, C.T.; Ohno, H. |
| Source: |
Proceedings of 11th International Conference on Ion Implantation Technology Ion implantation technology Ion Implantation Technology. Proceedings of the 11th International Conference on. :527-530 1996 |
| Relation: |
Proceedings of 11th International Conference on Ion Implantation Technology |
| Database: |
IEEE Xplore Digital Library |