| Title: |
Spatially-separated atomic layer deposition of Al2O3, a new option for high-throughput si solar cell passivation |
| Authors: |
Vermang, B.; Werner, F.; Stals, W.; Lorenz, A.; Rothschild, A.; John, J.; Poortmans, J.; Mertens, R.; Gortzen, R.; Poodt, P.; Roozeboom, F.; Schmidt, J. |
| Source: |
2011 37th IEEE Photovoltaic Specialists Conference Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE. :001144-001149 Jun, 2011 |
| Relation: |
2011 37th IEEE Photovoltaic Specialists Conference (PVSC) |
| Database: |
IEEE Xplore Digital Library |